상세정보

The basic and applied science of electroceramic thin films constitute one of the fast interdisciplinary evolving fields of research worldwide. A major driving force for the extensive research being performed in many Universities and Industrial and National Laboratories is the promise of applications of electroceramic thin ftlms into a whole new generation of advanced microdevices that may revolutionize various technologies and create new multibillion dollar markets. Properties of electroceramic thin films that are being intensively investigated include electrical conductivity, ferroelectricity, piezoelectricity, pyroelectricity, electro-optic activity, and magnetism. Perhaps the most publicized application of electroceramics is that related to the new high temperature superconducting (HTSC) materials, which has been extensively discussed in numerous national and international conferences, including NATO/ASI's and ARW's. Less glamorously publicized applications, but as important as those of HTSC materials, are those involving the other properties mentioned above, which were the subject of this ARW. Investigation on ferroelectric thin films has experienced a tremendous development in recent years due to the advent of sophisticated film synthesis techniques and a substantial improvement in the understanding of the related materials science and implementation of films in various novel devices. A major driving force behind the progress in this interdisciplinary field of research is the promise of the development of a new generation of non-volatile memories with long endurance and fast access time that can overcome the problems encountered in the semiconductor non-volatile memory of ferroelectric materials as high technology.

Proceedings of the NATO Advanced Research Workshop, Villa del Mare, Italy, June 20--24, 1994

The basic and applied science of electroceramic thin films constitute one of the fast interdisciplinary evolving fields of research worldwide. A major driving force for the extensive research being performed in many Universities and Industrial and National Laboratories is the promise of applications of electroceramic thin ftlms into a whole new generation of advanced microdevices that may revolutionize various technologies and create new multibillion dollar markets. Properties of electroceramic thin films that are being intensively investigated include electrical conductivity, ferroelectricity, piezoelectricity, pyroelectricity, electro-optic activity, and magnetism. Perhaps the most publicized application of electroceramics is that related to the new high temperature superconducting (HTSC) materials, which has been extensively discussed in numerous national and international conferences, including NATO/ASI's and ARW's. Less glamorously publicized applications, but as important as those of HTSC materials, are those involving the other properties mentioned above, which were the subject of this ARW. Investigation on ferroelectric thin films has experienced a tremendous development in recent years due to the advent of sophisticated film synthesis techniques and a substantial improvement in the understanding of the related materials science and implementation of films in various novel devices. A major driving force behind the progress in this interdisciplinary field of research is the promise of the development of a new generation of non-volatile memories with long endurance and fast access time that can overcome the problems encountered in the semiconductor non-volatile memory of ferroelectric materials as high technology.

정보제공 :

CONTENTS
Preface = ⅸ
Report on the NATO／ARW = xi
Acknowledgments = xvi
PULSED LASER ABLATION DEPOSITION AND CHARACTERIZATION OF FERROELECTRIC METAL OXIDE HETEROSTRUCTURES / R. Ramesh ; O. Auciello ; V. G. Keramidas ; R. Dat = 1
LOW ENERGY ION BOMBARDMENT INDUCED EFFECTS IN MULTI-COMPONENT ELECTROCERAMIC THIN FILMS / S. B. Krupanidhi = 23
GROWTH AND PROPERTIES OF Pb(M g1／3 N b2／3 ) O3 - PbTi O3 AND Pb(Zr, Ti) O3 THIN FILMS BY PULSED LASER DEPOSITION / A. Safari ; C. Tantigate ; J. Lee = 53
WAVELENGTH DEPENDENCE IN PULSED LASER DEPOSITION OF ZnO THIN FILMS / D. Cracium ; V. Craciun = 67
ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF LEAD ZIRCONATE TITANATE / M. De Keijser ; P. J. Van Veldhoven ; G. J. M. Dormans = 75
ALKOXIDE PROCURSORS FOR FERROELECTRIC THIN FILMS / M. I. Yanovskaya ; N. Y. A. Turova ; L. I. Solov`Yava = 85
DEPOSITION OF UNDOPED AND DOPED Pb(Mg, Nb) O3 - PbTi O3 , PbZ rx T i1-x O3 , ALKALINE EARTH TITANATE AND LAYERED PEROVSKITE THIN FILMS ON Pt AND CONDUCTIVE OXIDE ELECTRODES BY SPIN - ON PROCESSING : CORRELATION OF GROWTH AND ELECTRICAL PROPERTIES / M. Klee ; U. Mackens ; J. Pankert ; W. Brand ; W. Klee = 99
RELATIONSHIPS BETWEEN FERROELECTRIC 90°DOMAIN FORMATION AND ELECTRICAL PROPERTIES OF CHEMICALLY PREPARED Pb(Zr, Ti) O3 THIN FILMS / B. A. Tuttle ; T. J. Garino ; J. A. Viogt ; T. J. Headley ; D. Dimos ; M. O. Eatough = 117
CHARACTERIZATION OF SOL-GEL Pb(Z rx T i1-x ) O3 THIN FILM CAPACITORS WITH HYBRID（Pt, Ru O2 ）ELECTRODES / H. N. Al-Shareef ; O. Auciello ; A.I. Kingon = 133
ORGANICALLY MODIFIED SOL-GEL PRECURSORS FOR FERROELECTRIC DEPOSITION BY SPIN COATING / P. Gaucher ; J. Hector ; J.C. Kurfiss = 147
PREPARATION AND PROPERTIES OF CALCIUM MODIFIED LEAD TITANATE THIN FILMS / M.L. Calzada ; F. Carmona ; R. Sirera ; B. Jimenez = 157
MICROSTRUCTURE OF LEAD TITANATE-BASED THIN FILMS / L. Pardo ; J. Ricote ; M.L. Calzada = 167
STOICHIOMETRY AND PHASE STRUCTURE OF SOL-GEL DERIVED PZT-BASED THIN FILMS / M. Kosec ; Y. Huang ; E. Sato ; A. Bell ; N. Setter ; G. DraI ; S. Bernik ; T. Beltram = 177
LIGUID PHASE EPITAXY OF N a1-y y T a1-x -N bx O3 on KTaO3 SUBSTRATES / Z. Sitar ; R. Gutmann ; P. G u ·· nter = 187
PULSE SWITCHING CHARACTERIZATION OF FERROELECTRIC THIN FILMS / P.K. Larsen ; R. Cuppens ; G.J.M. Dormans = 201
POLARIZATION, CONDUCTION, AND BREAKDOWN IN NON-FERROELECTRIC PEROVSKITE THIN FILMS / R. Waser = 223
ANOMALOUS LOGARITHMIC DEPENDENCIES IN D.C. BREAKDOWN OF FERROELECTRIC THIN FILMS / J. F. Scott = 249
THE SHAPE OF THE HYSTERESIS CURVE OF FERROELECTRIC SINGLE CRYSTALS AND CERAMIC / G. Arlt = 261
FAST TRANSIENT MEASUREMENTS ON ELECTROCERAMIC THIN FILMS / G. W. Dietz ; M. Schumacher ; R. Waser = 269
THE INFLUENCE OF DOPANTS ON THE LEAKAGE CURRENT IN PZT THIN-FILM FERROELECTRIC CAPACITORS / D. J. Wouters ; G. Willems ; G. Groeseneken ; H. E. Maes ; K. Brooks ; R. Klissurska = 279
PHOTO-INDUCED STORAGE AND IMPRINTING IN (PB,LA)(ZR,TI) O3 THIN FILMS / D. Dimos ; W. L. Warren ; B. A. Tuttle = 291
DEPLETION, DEPOLARIZING EFFECTS AND SWITCHING IN FERROELECTRIC THIN FILMS / A. K. Tagantsev ; M. Landivar ; E. Colla ; K. G. Brooks ; N. Setter = 301
NONSTOICHIOMETY, EFECTS AND CHARGE TRANSPORT IN PZT / M. V. Raymond ; D. M. Smyth = 315
X-RAY DIFFERACTION LINE PROFILE ANALYSIS OF ANO THIN FILMS DEPOSITED ON AL-SI O3 -SI SUBSTRATES / P. Sutta ; Q. Jackuliak ; V. Tvarozec ; I. Novotny = 327
ELECTRON EMISSION FROM FERROELECTRICS / H. Gundel = 335
INTEGRATION OF FERROELECTRIC THIN FILMS FOR MEMORY APPLICATIONS / H. Achard ; H. Mace = 353
PROCESSING AND DEVICE ISSUES OF HIGH PERMITTIVITY MATERIALS FOR DRAMS / B. E. Gnade ; S. R. Summerfelt ; D. Crenshaw = 373
FERROELECTRIC THIN FILMS FOR CAPACITOR AND SENSOR APPLICATIONS / R. W. Whatmore ; P. Kirby ; A. Patel ; N. M. Shorrocks ; T. Bland ; M. Walker = 383
PIEZOELECTRIC AND REFFOELECTRIC DEVICES : POTENTIAL AND ISSUES / M. Syaer ; D. A. Barrow ; R. Noteboom ; E. M. Griswold ; Z. Wu = 399
INTEGRATED FERROELECTRIC MICROELECTROMECHANICAL SYSTEMS / D. L. Polla = 413
FUNDAMENTAL PROPERTIES AND SOME APPLICATIONS OF SOL-GEL CERAMIC THIN FILMS / A. S. Sigov ; V. I. Petrovsky ; E. F. Pevtsov ; K. A. Vorotilov ; A. S. Valeev = 427
SRT O3 THIN FILMS FOR OXYGEN SENSORS / J. Gerblinger ; H. Meixner = 439
INDEX = 455