| 000 | 00000cam u22002058a 4500 | |
| 001 | 000045958413 | |
| 005 | 20181024101421 | |
| 008 | 181024s1995 nju b 001 0 eng | |
| 010 | ▼a 95004918 | |
| 020 | ▼a 0815513771 | |
| 035 | ▼a (KERIS)BIB000002725068 | |
| 040 | ▼a 224010 ▼c 224010 ▼d 211009 | |
| 082 | 0 0 | ▼a 621.044 ▼2 23 |
| 084 | ▼a 621.044 ▼2 DDCK | |
| 090 | ▼a 621.044 ▼b H638h | |
| 245 | 1 0 | ▼a High density plasma sources : / ▼c edited by Oleg A. Popov. |
| 260 | ▼a Park Ridge, NJ : ▼b Noyes Publications, ▼c 1995. | |
| 300 | ▼a 445 pages ; ▼c 24 cm. | |
| 504 | ▼a Includes bibliographical references and index. | |
| 650 | 0 | ▼a Plasma density. |
| 650 | 0 | ▼a Plasma generators. |
| 650 | 0 | ▼a High temperature plasmas. |
| 700 | 1 | ▼a Popov, Oleg A. |
소장정보
| No. | 소장처 | 청구기호 | 등록번호 | 도서상태 | 반납예정일 | 예약 | 서비스 |
|---|---|---|---|---|---|---|---|
| No. 1 | 소장처 세종학술정보원/과학기술실(5층)/ | 청구기호 621.044 H638h | 등록번호 151342820 | 도서상태 대출불가(자료실) | 반납예정일 | 예약 | 서비스 |
컨텐츠정보
책소개
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.
This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
정보제공 :
목차
Helicon Plasma Sources
Planar Inductive Sources
Electrostatically-Shielded Inductively-Coupled RF Plasma Sources
Very High Frequency Capacitive Plasma Sources
Surface Wave Plasma Sources
Microwave Plasma Disk Processing Machines
Electron Cyclotron Resonance Plasma Sources
Distributed ECR Plasma Sources
References
Index
정보제공 :