| 000 | 00755namuu2200241 a 4500 | |
| 001 | 000001095803 | |
| 005 | 20031209141159 | |
| 008 | 020514s2002 nyu b 000 0 eng | |
| 010 | ▼a 2002070662 | |
| 020 | ▼a 0444510958 | |
| 040 | ▼a DLC ▼c DLC ▼d 244002 | |
| 042 | ▼a pcc | |
| 049 | 0 | ▼l 151150923 |
| 050 | 0 0 | ▼a TA2020 ▼b .A63 2002 |
| 082 | 0 0 | ▼a 621.044 ▼2 21 |
| 090 | ▼a 621.044 ▼b A244 | |
| 245 | 0 0 | ▼a Advances in low temperature rf plasmas : ▼b basis for process design / ▼c [edited by] T. Makabe. |
| 260 | ▼a New York : ▼b Elsevier, ▼c 2002. | |
| 300 | ▼a xii, 341p. 28cm. | |
| 504 | ▼a Includes bibliographical references. | |
| 650 | 0 | ▼a Low temperature plasmas ▼x Industrial applications. |
| 700 | 1 | ▼a Makabe, T. ▼q (Toshiaki) |
Holdings Information
| No. | Location | Call Number | Accession No. | Availability | Due Date | Make a Reservation | Service |
|---|---|---|---|---|---|---|---|
| No. 1 | Location Sejong Academic Information Center/Science & Technology/ | Call Number 621.044 A244 | Accession No. 151150923 (1회 대출) | Availability Loan can not(reference room) | Due Date | Make a Reservation | Service |